Oryx Advanced Materials Chromium Sputtering Target 99.95% Pure D4.5 X 0.25in NEW
This sputtering target provides high-purity chromium material, exhibiting 99.99% purity for thin film deposition applications. Model: Chromium Sputtering Target. Material: Chromium (Cr). Impurity (Magnesium): 4 ppm wt %.